[PDF.34on] Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)

[PDF.wv02] Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)

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 | #4175321 in Books |  Noyes Publications |  1993-01-14 | Original language:English | PDF # 1 |  9.21 x.63 x6.14l,1.05 | File type: PDF | 251 pages

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|| |"After reading this book, an engineer should have all the necessary background." - European Semiconductor

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

You can specify the type of files you want, for your device.Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology)   |  John E.J. Schmitz. I really enjoyed this book and have already told so many people about it!

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